High rate reactive dc magnetron sputter deposition of Al2O3 films
Aluminum oxide films were produced by reactive dc magnetron sputtering of Al in Ar+O2. The composition of the films was characterized by Rutherford backscattering measurements. Stoichiometric films possessed excellent optical properties with a refractive index of ∼1.6 for visible and near-infrared light. It was possible to produce stoichiometric films while keeping the target in the metallic mode
