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Heat Release in the End-Gas Prior to Knock in Lean, Rich and Stoichiometric Mixtures With and Without Egr

SI Engine knock is caused by autoignition in the unburnt part of the mixture (end-gas) ahead of the propagating flame. Autoignition of the end-gas occurs when the temperature and pressure exceeds a critical limit when comparatively slow reactions - releasing moderate amounts of heat - transform into ignition and rapid heat release. In this paper the difference in the heat released in the end-gas

Expressiveness of the modal mu-calculus on monotone neighborhood structures

We characterize the expressive power of the modal mu-calculus on monotone neighborhood structures, in the style of the Janin-Walukiewicz theorem for the standard modal mu-calculus. For this purpose we consider a monadic second-order logic for monotone neighborhood structures. Our main result shows that the monotone modal mu-calculus corresponds exactly to the fragment of this second-order language

Fixed parameter algorithms and other results for convex patitions

It is known that the minimum edge length convex partition MWCP of polygons with holes (an example of a PSLG) is NP-hard. Partitioning polygons with holes into the minimum number of convex polygons MNCP is also known to be NP-hard. We show that The MWCP and MNCP problem for general PSLGs where the sum of the hole vertices and re ex vertices inside the convex hull is sub-logarithmic can be solved in

Bäst förmåga eller starkast drivkraft? - Reflektioner kring rekrytering till forskarutbildning

I denna korta artikel reflekterar jag kring rekrytering till forskarutbildning och de faktorer som styr och influerar processen: (i) Det som ska ligga till grund för beredning och beslut enligt Högskoleförordningen och föreskrifter/beslut vid enskilda lärosäten, (ii) Målformuleringar för forskarutbildning enligt Högskolelagen, Högskoleförordningen och föreskrifter/beslut vid enskilda lärosäten, (i

Semiconductor nanowires as a novel electronic materials technology for future electronic devices

Abstract in UndeterminedExtreme down-scaling of nanoelectronic devices by top-down fabrication methods may be hindered by several obstacles, such as the cost for patterning and processing, or inferior device performance due to process-induced damage. In this presentation I will present a bottom-up approach for nanometer-scale device fabrication, based on seeded growth of semiconductor nanowires, u