Block Copolymer Nanopatterning of Dielectric Mask for Selective Area InAs Vertical Nanowire Growth
Nanowire (NW) based devices provide bright possibilities for many different applications [1]. The use of block copolymers (BCPs) for nanopatterning of dielectric masks for selective area metal-organic vapor phase epitaxy (MOVPE) of III-V nanowires [2] and for NW-device applications [3] has a great potential, when it comes to increasing the NW density and reducing their diameters, which is importan