Dry release of suspended nanostructures
A dry release method for fabrication of suspended nanostructures is presented. The technique has been combined with an anti-stiction treatment for fabrication of nanocantilever based nanoelectromechanical systems (NEMS). The process combines a dry release method, using a supporting layer of photoresist which is removed using oxygen ashing in a reactive ion etcher (RIE), with CHF3 plasma induced de