Surface Chemistry in the Initial Stages of Titanium Nitride Atomic Layer Deposition Using Operando Ambient Pressure X-ray Photoelectron Spectroscopy
Studies of the surface chemistry of the first few cycles of atomic layer deposition (ALD) using in situ and time-resolved operando techniques are attractive for realizing, understanding, and obtaining true mechanistic information during the deposition. However, the latter techniques are yet to be applied to ALD of metal nitrides. Here, we present a surface-chemistry investigation through a time-re
